Preparation Process and Performance Improvement of Semiconductor Materials under Magnetic Field

Author of the article:HU Mingwei1 , WANG Yaning2 , YANG Ruiming2 , YUAN Yi1 , LIU Tie2 , WANG Qiang2

Author's Workplace：1. School of Metallurgy, Northeastern University, Shenyang 110819, China; 2. Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, Shenyang 110819, China

Key Words：magnetic field; semiconductor materials; crystal orientation; microstructure

Abstract：As an external field, magnetic field has been widely used in the preparation of various materials in recent years. The preparation technology for semiconductor materials under magnetic field has combined magnetic field with traditional semiconductor material preparation process, including the Czochralski method, melting method, hydrothermal method and slip casting method. In this paper, the research status of the application of magnetic field in different preparation methods of semiconductor materials is introduced. The equipment of different methods, the improvement of semiconductor material performance and the mechanism of magnetic field are also described, and the future development of magnetic field in semiconductor material preparation is prospected.