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磁控溅射用高纯铬靶材的研究现状及发展趋势
Research Status and Development Trend of High Purity Chromium Target Material for Magnetron Sputtering
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- DOI:
- 作者:
- 徐飞 布国亮 杨万朋 成佳佳 肖夫兰
XU Fei;BU Guoliang;YANG Wanpeng;CHENG Jiajia;XIAO Fulan
- 作者单位:
- 西安嘉业航空科技有限公司
Xi’an Jiaye Aviation Technology Co.,Ltd.,Xi'an 710089,China
- 关键词:
- 磁控溅射 高纯铬靶材 研究现状 发展趋势
magnetron sputtering high purity chromium target research status development trend
- 摘要:
- 介绍了纯铬靶材的主要制备工艺流程及研究现状,介绍了采用热等静压方法制备的纯铬靶材圆柱体致密度高达99.86%,晶粒细小、溅射性能优异;阐述了高纯溅射铬靶材的特性,分析了高纯铬靶材存在的问题;探讨和展望了高纯铬溅射靶材的发展趋势。The main preparation process and research status of pure chromium target materials were introduced.AISO,introdced the density of pure chromium target cylinder prepared by hot isostatic pressure is up to 99.86%,with fine grain and excellent sputtering performance.The characteristics of high purity sputtered chromium target were described and the problems existing in high purity chromium target were analyzed.The development trend of high purity chromium sputtering target was discussed and prospected.