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Cr/Zr 微合金化调控铸造Al-Cu-Mg-Si 合金点蚀倾向性研究
Study on Pitting Tendency Control of Cast Al-Cu-Mg-SiAlloy by Cr/Zr Microalloying
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- DOI:
- 作者:
- 孙岚曦 1，2，袁祥耀 1，2，王 瑞 1，2，钟纪康 1，3，王东涛 1，2，长海博文 1，2
SUN Lanxi1,2, YUAN Xiangyao1,2, WANG Rui1,2, ZHONG Jikang1,3,WANG Dongtao1,2, NAGAUMI Hiromi1,2
- 作者单位:
- 1. 苏州大学 高性能金属结构材料研究院，江苏 苏州 215000；2. 苏州大学 金属材料与先进制造学院，江苏 苏州 215000；3. 辽宁工业大学 材料科学与工程学院，辽宁 锦州 121001
1. High-Performance Metal Structural Materials Research Institute, Soochow University, Suzhou 215000, China; 2. School ofMetallic Materials and Advanced Manufacturing, Soochow University, Suzhou 215000, China; 3. School of Materials Scienceand Engineering, Liaoning University of Technology, Jinzhou 121001, China
- 关键词:
- 微合金化；点蚀抗性；电化学分析；Al-Cu-Mg-Si 合金
microalloying; pitting resistance; electrochemical analysis; Al-Cu-Mg-Si alloy
- 摘要:
- Al-Cu-Mg-Si 是常用的高强铸造铝合金系列，然而含 Cu 相的存在会导致其在含 Cl- 环境中发生严重点蚀，极大限制了其应用范围。 本文通过扫描电子显微镜观察腐蚀形貌，结合电化学分析，研究了铸造 Al-5.6Cu-0.3Mg-0.3Si 合金中点蚀的萌生与扩展行为，并通过添加 Cr/Zr 元素实现合金点蚀倾向性的抑制。 结果表明，点蚀萌生于含 Cu 相，并沿晶界扩展；点蚀尺寸与含铜相分布密切相关，Cr/Zr 添加通过晶粒细化显著减小晶界处含铜相尺寸，从而降低点蚀规模。相较于基础合金，Cr/Zr 添加使表面钝化膜等效厚度分别增加了 112%和 171%，电荷转移电阻大幅提升，二者共同实现界面电化学反应的抑制进而降低点蚀倾向性。 与基础合金相比，0.2%(质量分数)Zr 的添加使腐蚀电流密度、最大点蚀深度和点蚀面积分别降低了 68.7%、48.0%和 74.8%。Al-Cu-Mg-Si is a commonly used high-strength cast aluminium alloy series; however, the presence ofCu-containing phases causes severe pitting in chloride-containing environments, which significantly limits its applicationpotential. In the present work, the initiation and propagation of pitting in cast Al-5.6Cu-0.3Mg-0.3Si alloys weresystematically analysed by observing corrosion morphologies via SEM combined with electrochemical analysis. Thedevelopment of a high-pit resistance alloy was achieved by the addition of Cr or Zr. The results indicate that the initiationof pitting occurs at Cu-containing phases and that the propagation of pitting occurs along grain boundaries. The size ofpitting is correlated with the distribution of Cu-containing phases, and the addition of Cr or Zr significantly reduces the sizeof Cu-containing phases present at grain boundaries by grain refinement, thereby reducing the size of pitting. Comparedwith the base alloy, the addition of Cr or Zr increaseds the equivalent thickness of the passive films by 112% and 171%,respectively, and the substantial increase in charge transfer resistance is the primary factor in inhibiting interfacialelectrochemical reactions. The alloy with 0.2 wt.% Zr addition exhibiteds decreases in the corrosion current density,maximum pitting depth and pitting area of 68.7%, 48.0% and 74.8%, respectively